World News | November 2011
Plasma Etch rolls out the PE-100 Convertible
The company has introduced a revolutionary new plasma system that incorporates two individual plasma etching or cleaning type or mode technologies into one complete stand-alone plasma etching or cleaning systems.
The PE-100 convertible allows the user the ability to switch back and forth between RIE anisotropic type etching mode applications and isotropic type etching/cleaning mode applications. Traditionally, two separate stand-alone plasma systems were necessary to achieve this capability. The PE-100 Convertible is a perfect system for R&D, medical devices, solar cells, nanotechnology, optics, printed circuit boards, wafer-level packaging and laboratories applications as well as many other related semi-conductor processes.